Dispositif photonique ayant une couche de revêtement inférieur de cristal photonique disposée sur un substrat semi-conducteur

A photonic device having a photonic crystal lower cladding layer provided on a semiconductor substrate

Abstract

L'invention concerne une structure d'isolation optique, laquelle peut isoler un dispositif photonique, par exemple un guide d'ondes, ou un autre dispositif photonique qui inclut un guide d'ondes en tant que partie de sa structure, à partir du matériau de base d'un substrat sous-jacent. La structure d'isolation optique sert aussi de revêtement inférieur pour le confinement vertical de la lumière traversant le dispositif photonique. La structure d'isolation optique est formée d'un cristal photonique fabriqué dans le substrat au-dessus duquel le reste du dispositif photonique est formé. Le dispositif photonique inclut un guide d'ondes ayant un noyau optiquement isolé du substrat par la couche de revêtement inférieur de cristal photonique.
The invention provides an optical isolation structure, which can isolate a photonic device such as a waveguide, or other photonic device which includes a waveguide as part of its structure, from the bulk material of an underlying substrate. The optical isolation structure also serves as a lower cladding for vertical confinement of light passing through the photonic device. The optical isolation structure is formed of a photonic crystal fabricated in the substrate over which the remainder of the photonic device is formed. The photonic device includes a waveguide having a core optically isolated from the substrate by the photonic crystal lower cladding layer.

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Patent Citations (6)

    Publication numberPublication dateAssigneeTitle
    US-2013005606-A1January 03, 2013Omega Optics, Inc.Packaged chip for multiplexing photonic crystal waveguide and photonic crystal slot waveguide devices for chip-integrated label-free detection and absorption spectroscopy with high throughput, sensitivity, and specificity
    US-6674949-B2January 06, 2004Corning IncorporatedActive photonic crystal waveguide device and method
    US-6768828-B2July 27, 2004Little Optics Inc.Integrated optical circuit with dense planarized cladding layer
    US-6993212-B2January 31, 2006Intel CorporationOptical waveguide devices having adjustable waveguide cladding
    US-7039288-B2May 02, 2006Intel CorporationFabrication of optical waveguides for reduction of minimum waveguide spacing
    WO-0214915-A2February 21, 2002Mcmaster UniversityProduction d'un guide d'ondes optiques de type silicium sur isolant par oxydation locale du silicium

NO-Patent Citations (1)

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    See also references of EP 3014666A4

Cited By (0)

    Publication numberPublication dateAssigneeTitle